Nanoimprinting functions and applications
Nanoimprint lithography (NIL) is a high-precision, cost-effective, high-throughput replication technology. The micro-and nanostructures imprinted on the flexible and rigid substrate can generate multivariate functionalities. Functionalities include superhydrophobicity, Super hydrophilicity, antireflective, high optical transmission, anti-fogging with anti-UV transmission, etc.
Nanoimprint lithography has many applications, including patterned sapphire substrates for LED, sensors, solar cells, wafer level optics (WLO), multi-lens array (MLA), and flat optics. Additional applications include diffractive optical element (DOE) for LiDar sensors, grating lens for augmented reality / virtual reality (AR/VR), and biomedical devices such as lap-on-a-chip, microarray biochips etc.